diener electronic  |  Plasma-Surface-Technology Plasma Plasma systems Surface-Technology
 
german english spanish english turkish italian french
russian polish czech chinese japanese taiwanese korean
home
  plasma technique
  glossary of terms
  FAQ
  products
  low pressure plasma
    Yocto
    Zepto - low-cost
    Atto - low-cost
    Femto
    Femto UHP
    Femto PCCE
    Pico
    Pico UHP
    Nano
    Nano UHP
    Tetra-30-LF
    Tetra-30-LF-PC
    Tetra-100-LF
    Tetra-100-LF-PC
    Tetra-150-LF
    Tetra-150-LF-PC
    special systems
    system schemes
    structure variation
    controls
    options/accessories
    electron microscopy
    pirani vacuum meter
  atmospheric plasma
  generators
  plasma indicator tags
  microwave coupling
  plasma-exhaust
cleaning
  services
  representatives
  references
  download area
  trade fairs
  contact us
  approach
  about us
   
 

STANDARD PLASMA SYSTEMS

 

[ PLASMA SYSTEM PICO UHP - PLASMA ETCHER ]

   
  The plasma system PICO UHP with 4 litres chamber volume and semi-automatic control is mainly used for:
  • small scale production
  • analysis (SEM, TEM)
  • medical technology
  • research and development
  • semi conductor technology
  • plastic technology

UHP stands for Ultra High Purity. This designation is used for the glass chambers of our plasma systems, which can be, depending upon customer's request, made from Borosilicate glass or Quartz glass. The option of UHP is available only for the following units:
Femto, Pico und Nano.

Glass chambers are used in microwave systems and/or with applications where ultra pure surfacing is necessary.  Stainless steel or aluminum chambers can sputter in the smallest quantities, like all metals in a plasma system. For most processes this is not of importance and absolutely negligibly. The aluminum construction units from the UHP plant are coated with AL2O3.

The plasma system Pico UHP doesn't have a stainless steel chamber; thus, it is suitable for applications in which vestiges of chrome, nickel and iron are inconveniant.
   
   
 
 

Technical Data:
Plasma etcher PICO UHP

switchgear cabinet:
W 550 mm, H 330 mm, D 500 mm
chamber:
Ø 130 mm, L 300 mm
chamber opening Ø: 125 mm
materials: quartz or borosilicate glass
front-and backside of the chamber: aluminium
chamber volume:
approx. 4 litres
gas supply:
two gas channels through needle valve
generator:
40kHz/100 W, infinitely variable
(optional: 13.56 MHz or 2.45 GHz)
vacuum pump:
Leybold, Type Trivac D2.5B (2.5 m³/h)
trays:
1 pc. tray
control:
semi-automatic, process time by timer

options / accessories

 
Plasma system PICO UHP: It is also possible to use this system for plasma cleaning of optical parts - plasma cleaner

Plasma system PICO UHP: It is also possible to use this system for cleaning of optical parts.

PICO UHP - plasma technology at work

Plasma in PICO UHP.

   
   
  The mentioned prices are without obligation
Please contact us if you have technical questions.
   
   
  home | plasma technique | glossary of terms | FAQ | plasma systems | plasma system rental | wage labour | consulting | links/representatives | references | download | trade fairs | contact | approach | about us | imprint
  © 2015 Diener electronic GmbH + Co. KG    Webdesign Heindl Internet AG