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STANDARD PLASMA SYSTEMS

 

[ PLASMA SYSTEM NANO UHP - PLASMA ETCHER ]

   
  The plasma system Nano UHP with 18 litres chamber volume and semi-automatic control is mainly used for:
  • small scale production
  • analysis (SEM, TEM)
  • electronic technology
  • medical technology
  • plastics technology
  • elastomer technology
  • research and development

UHP stands for Ultra High Purity. This designation is used for the glass chambers of our plasma systems, which can be, depending upon customer's request, made from Borosilicate glass or Quartz glass. The option of UHP is available only for the following units:
Femto, Pico und Nano.

Glass chambers are used in microwave systems and/or with applications where ultra pure surfacing is necessary.  Stainless steel or aluminum chambers can sputter in the smallest quantities, like all metals in a plasma system. For most processes this is not of importance and absolutely negligibly. The aluminum construction units from the UHP plant are coated with AL2O3.

The plasma system NANO UHP doesn't have a stainless steel chamber thus it is suitable for applications in which vestiges of chrome, nickel and iron are inconveniant.

   
   
 
 

Technical Data:
Plasma etcher NANO UHP

switchgear cabinet:
W 580 mm, H 650 mm, D 600 mm
chamber:
Ø 240 mm, L 400 mm
(optional: L 600 mm)
materials: quartz or borosilicate glass
front-and backside of the chamber: aluminium
chamber volume:
approx. 18 litres
gas supply:
two gas channels through needle valve
generator:
40kHz/300 W, infinitely variable
(optional: 13.56 MHz or 2.45 GHz)
vacuum pump:
Leybold, Type D8B (8 m³/h)
trays:

1 pc. tray
control:
semi-automatic, process time by timer

Options / accessories

 
Plasma system: NANO UHP with semi-automatic control - plasma coating

Plasma system NANO UHP with semi-automatic control: cleaning, activating, etching, deposition of coatings
   
   
  Please contact us if you have technical questions.
   
   
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