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STANDARD PLASMA SYSTEMS NANO

[ PLASMA CLEANER - PLASMA ETCHER - PLASMA ASHER - PLASMA ACTIVATION ]



The NANO plasma cleaner are available in many different configurations. The following is an overview of the most common plasma cleaner.

Give us a call! We´d be happy to discuss more details. Tel.: +49 (0) 7458 - 999 31 - 0

Brochure NANO (PDF 1068 KB)


Basic configuration

- The outer body varies depending on the components / options
- Chamber volume: depending on the version 18 - 36 liters
- Power supply: 230 V AC for table top systems or
   400 V AC/ 3 phases for stand alone systems

Gas supply

- Needle valve
- Mass-Flow-Controller (MFCs)

Vacuum chambers

- Stainless steel
    round with cover
    (approx. Ø 267 mm, L 420mm or L 600 mm) or
    rectangular with hinged door
    (approx. W 240 x H 240 x D 420 mm or 600 mm)

- Aluminium
    round with cover or with hinged door
    (approx. Ø 240 mm, L 400 mm or L 600 mm)

- Quartzglass (UHP)
    round with cover or with hinged door
    (approx. Ø 240 mm, L 400 mm or L 600 mm)

- Borosilicate glass (UHP)
    round with cover or with hinged door
    (approx. Ø 240 mm, L 400 mm or L 600 mm)

Loading with

  Tray (option: water-cooled), quartz glass boat,
  rotary drum for powder, rotary drum for bulk materials, flat tray Aluminium,
  flat tray stainless steel, flat tray borosilicate glass,
  flat tray quartz glass

Electrodes

- One or multi level electrode
- RIE - electrode

Control

- Semi automatic
- PCCE-Control (Microsoft Windows CE)
- PC-Control (Microsoft Windows XPE)

Pressure measurement

- Pirani sensor
- Baratron (for the corrosive gas version)

Timer

- Digital

Generator

  Frequencies:     40 kHz: Power 0 - 300 W; 0 - 1000 W
                       13.56 MHz: Power 0 - 100 W; 0 - 300 W
                         2.45 GHz: Power 0 - 600 W

  All generators are continuously adjustable from 0 - 100%

Vacuum pump

- in different sizes from different manufacturers
  (As required with active carbon filter)


 

Here are some examples of our
NANO housings



Plasma system NANO version 1: Plasma cleaner, Plasma asher, Plasma activation, Plasma etcher
 NANO example version 1

Plasma system NANO version 2 for small productions, Process development, cleaning, activating, etching
 NANO example version 2

Plasma system NANO version 3: Plasma cleaner, Plasma asher, Plasma activation, Plasma etcher
 NANO example version 3

Plasma system NANO version 4 with PCCE control for series production, small productions, Process development, cleaning, activating, etching, coating
 NANO example version 4

Plasma system NANO version 5: Plasma cleaner, Plasma asher, Plasma activation, Plasma etcher
 NANO example version 5

Plasma system NANO version 6: Plasma cleaner, Plasma asher, Plasma activation, Plasma etcher
 NANO example version 6



Please contact us for technical advice regarding these systems.

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